I am a principal research engineer in materials chemistry and a member of the Pedersen Group in the Department of Physics, Chemistry, and Biology at Link枚ping University in Sweden; where I received both an MSc in Chemistry in 2021 and a PhD in Materials Chemistry in 2025.
My research interests are in inorganic materials chemistry with a focus on atomic layer deposition (ALD). I have been working on understanding, on a fundamental atomic level, the surface chemistry governing the deposition of metastable ternary nitride thin layers of materials by time-resolved chemical vapor deposition (CVD) and or ALD, for protective hard coating applications ()
Currently, I鈥檓 collaborating with Swedish industry in the manufacture of semiconductor components and other projects around deposition and etching of different materials. I鈥檓 also responsible for equipment in research labs, guiding and assisting doctoral students and thesis workers.
My research interests are in inorganic materials chemistry with a focus on atomic layer deposition (ALD). I have been working on understanding, on a fundamental atomic level, the surface chemistry governing the deposition of metastable ternary nitride thin layers of materials by time-resolved chemical vapor deposition (CVD) and or ALD, for protective hard coating applications ()
Currently, I鈥檓 collaborating with Swedish industry in the manufacture of semiconductor components and other projects around deposition and etching of different materials. I鈥檓 also responsible for equipment in research labs, guiding and assisting doctoral students and thesis workers.